Department of Mechanical Engineering, National Cheng Kung University (NCKU), Tainan, China

Biography: Dr. Yung-Chun Lee received his B.S. degree in Mechanical Engineering (1985) and M.S. degree in Applied Mechanics (1989) both from National Taiwan University, Taipei, Taiwan, and Ph.D. degree in Theoretical and Applied Mechanics (1994) from Northwestern University, IL, USA. He was a post-doc. researcher (1994-1996) in the Department of Engineering and Applied Physics, Cornell University, NY, USA, and a project engineer (1996-1997) in Hon-Hai Precision Industry Inc., Taipei, Taiwan. He joined the Department of Mechanical Engineering, National Cheng Kung University (NCKU), Tainan, Taiwan in 1997 and is now a Distinguished Professor there.
Dr. Lee's research areas include piezoelectric devices, excimer laser micromachining, micro/nano-fabrication based on nano-imprinting, contact printing, and roller imprinting technologies, and maskless/direct-write lithography. He has published 100 plus SCI-indexed journal papers and 2 book chapters. He has obtained 40-plus patents in Taiwan and other countries and received the 2016 Outstanding Award for Academy-Industry Collaboration and Technology Transfer of NCKU. He was the PI of several research projects in Taiwan’s National Research Program for Nanoscience and Technology (2004~2014) and is now conducting two major research projects on developing advanced micro/nano-fabricating methods and their industrial applications. His reach works have initiated three start-up companies in Taiwan since 2010.

Speech Title: Contact Printing and Nano-Imprinting Lithography for Large Area Micro/Nano-Fabrication with Industrial Applications
Abstract: This paper presents several micro/nano-fabrication technologies developed for industry applications of large-area micro/nano-structures. These methods stem from the idea of nano-imprinting and contact printing, but have been significantly modified according to different targeted products and final applications. The ultimate goal is to establish simple but reliable tools and processes for effective and inexpensive micro/nano-fabrication, and hence become useful to industry.
First of all, a new type of metal contact printing method is applied to pattern metallic nano-structures on either planar or curved surfaces. It can be directly used for generating plasmon resonance phenomena for specific optical performance. It can also be used for creating moth’s eye nano-structures for anti-reflection and anti-glaring. When applying this method to curved surfaces of a lens, one can directly form the anti-reflection on the lens which is made of hard materials.
Secondly, a soft photomask lithography technology is developed to incorporate the advantages of nano-imprinting into conventional photolithography. The based idea is to form a soft photomask through nano-imprinting process and then use the soft mask to perform contact photolithography. It allows sub-micrometer (~0.3 m) patterning over a large wafer (~8”) with laboratory-built tools and minimum expenses. This method has been transferred to LED industry for mass-production of patterned sapphire substrates. Detailed information and future perspectives will be addressed.